RESEARCHER PROFILE

Timo Sajavaara

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University of Jyväskylä

Semiconductor materials and devicesCopper Interconnects and ReliabilityIon-surface interactions and analysisAdvanced Materials and Semiconductor TechnologiesElectron and X-Ray Spectroscopy Techniques

Timo Sajavaara works in Semiconductor materials and devices, Copper Interconnects and Reliability, Ion-surface interactions and analysis, Advanced Materials and Semiconductor Technologies, Electron and X-Ray Spectroscopy Techniques. Recorded institutional associations include University of Jyväskylä.

300Publications
9,164Citations
57H-index

Inclusion identifies researchers whose recorded research contributions may inform their university’s understanding of its research community. It does not rank individual research quality or establish current employment.

Selected research works

Up to 100 highly cited works; DOI links open the original research. Counts reflect the collected record, not real-time citation totals.

  1. Atomic Layer Deposition of Oxide Thin Films with Metal Alkoxides as Oxygen Sources

    2000 · 489 citations
  2. Atomic Layer Deposition of Platinum Thin Films

    2003 · 399 citations
  3. Effect of water dose on the atomic layer deposition rate of oxide thin films

    2000 · 260 citations
  4. Potku – New analysis software for heavy ion elastic recoil detection analysis

    2014 · 252 citations
  5. Atomic Layer Deposition of Photocatalytic TiO2 Thin Films from Titanium Tetramethoxide and Water

    2004 · 218 citations
  6. Atomic Layer Deposition of Hafnium Dioxide Films from Hafnium Tetrakis(ethylmethylamide) and Water

    2002 · 199 citations
  7. Aluminum oxide from trimethylaluminum and water by atomic layer deposition: The temperature dependence of residual stress, elastic modulus, hardness and adhesion

    2013 · 184 citations
  8. Detection efficiency of time-of-flight energy elastic recoil detection analysis systems

    1999 · 167 citations
  9. Comparison of hafnium oxide films grown by atomic layer deposition from iodide and chloride precursors

    2002 · 145 citations
  10. Short-ranged structural rearrangement and enhancement of mechanical properties of organosilicate glasses induced by ultraviolet radiation

    2006 · 131 citations
  11. Properties of AlN grown by plasma enhanced atomic layer deposition

    2011 · 123 citations
  12. Atomic layer deposition of polyimide thin films

    2006 · 121 citations
  13. Plasma-Enhanced Atomic Layer Deposition of Silver Thin Films

    2011 · 119 citations
  14. Atomic Layer Deposition of SrTiO3 Thin Films from a Novel Strontium Precursor-Strontium-bis(tri-isopropyl cyclopentadienyl)

    2001 · 111 citations
  15. Low-temperature atomic layer deposition of ZnO thin films: Control of crystallinity and orientation

    2011 · 110 citations
  16. Low-Temperature ALE Deposition of Y2O3 Thin Films from β-Diketonate Precursors

    2001 · 106 citations
  17. Studies on atomic layer deposition of MOF-5 thin films

    2013 · 99 citations
  18. Review Article: Recommended reading list of early publications on atomic layer deposition—Outcome of the “Virtual Project on the History of ALD”

    2016 · 96 citations
  19. Surface-controlled growth of LaAlO3 thin films by atomic layer epitaxy

    2001 · 93 citations
  20. Atomic layer deposition of hafnium dioxide thin films from hafnium tetrakis(dimethylamide) and water

    2005 · 92 citations
  21. Overview of material re-deposition and fuel retention studies at JET with the Gas Box divertor

    2006 · 92 citations
  22. Atomic layer deposition of lithium containing thin films

    2009 · 90 citations
  23. Time-of-flight – Energy spectrometer for elemental depth profiling – Jyväskylä design

    2014 · 81 citations
  24. Thermal and plasma enhanced atomic layer deposition of SiO2 using commercial silicon precursors

    2014 · 80 citations
  25. Monte Carlo simulation of multiple and plural scattering in elastic recoil detection

    2001 · 80 citations

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